To simplify the structure of an antenna, reduce the cost of replacing component, and facilitate maintenance by arranging at least one linear antenna for generating an induction field for forming plasma by the supply of high frequency power within a vacuum container.

At least one inner linear antenna 9 is arranged so as to cross a plasma forming chamber 1 having gas introduction pipes 3a, 3b at the top, an exhaust pipe 4 at the bottom, and a base plate stage 5 for placing a workpiece 6 on the inside. The outer circumference of an antenna conductor such as a copper pipe inside which a coolant flows is covered with an insulator, and one end is connected to a high frequency power source 13 through a matching device 12 containing a capacitor. By connecting the capacitor to the other end to be earthed, electrostatic coupling with plasma P can be controlled. By using the inner linear antenna 9 suitable for replacement when it is consumed by sputtering, power transmission efficiency is made higher than an outer setting type antenna, and although the magnetic flux density is lower than a loop type, the antenna 9 is near to the plasma P and has high contribution factor.