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Title:
HIGH FREQUENCY INDUCTION COUPLED PLASMA MASS SPECTROMETER
Document Type and Number:
Japanese Patent JPH04109542
Kind Code:
A
Abstract:

PURPOSE: To prevent detection sensitivity lowering at the time of analysis by providing a controller making a gas flow rate at the time of analysis smaller by a fixed value α than that at the time of sensitivity adjustment.

CONSTITUTION: The adjustment of detection sensitivity is made so as to make the signal strength of an argon dimer become maximum. After such a sensitivity adjustment is finished, the analysis of a specimen is made at a gas flow rate B smaller than that A used in the sensitivity adjustment. Here the relation, B=A-α, exists between the gas flow rates A and B, and the value of α is previously determined from data obtained by experiments, etc., to be memorized in a memory within a controller 21. Thereupon a gas flow rate supplied to ICP-MS is made the same flow rate A as at the time of sensitivity adjustment. Consequently the maximum signal can be obtained when a specimen is vaporized in a heat vaporization induction device, and sensitivity lowering can be prevented.


Inventors:
TERASHI KEIICHI
Application Number:
JP22710990A
Publication Date:
April 10, 1992
Filing Date:
August 29, 1990
Export Citation:
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Assignee:
YOKOGAWA ELECTRIC CORP
International Classes:
G01N27/62; H01J49/04; H01J49/26; (IPC1-7): G01N27/62; H01J49/04; H01J49/26
Attorney, Agent or Firm:
Watanabe Masayasu



 
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