Title:
プラズマ処理用高周波誘導プラズマ源装置
Document Type and Number:
Japanese Patent JP3987545
Kind Code:
B2
Abstract:
Plasma generator (10) includes chamber (14) for containing the plasma source and a plurality of coils (12) located inside of chamber (14). Located external to chamber (14) are a plurality of permanent multipolar magnets (34) operable to establish a magnetic field in the plasma source along an axis of chamber (14) and a set of electromagnets (36) located outside of chamber (14), which define a preferred propagation direction for a whistler wave in chamber (14). Coils (12) resonantly inductive couple RF power to the whistler wave so as to transfer a sufficient amount of energy to the plasma source to induce a plasma state in the plasma source. Coils (12) also generate time varying electromagnetic fields which also sustain the plasma state in the plasma source.
Inventors:
Agitopy.
Application Number:
JP2005134844A
Publication Date:
October 10, 2007
Filing Date:
May 06, 2005
Export Citation:
Assignee:
Texas Instruments Incorporated
International Classes:
H01L21/3065; C23F4/00; H01J37/32; H05H1/46
Domestic Patent References:
| JP3837171B2 | ||||
| JP4147969A | ||||
| JP3068773A | ||||
| JP1179323A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Hayashi Zouzo
Kuniaki Shimizu
Hajime Asamura
Hayashi Zouzo
Kuniaki Shimizu