Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
HIGH FREQUENCY ION PLATING DEVICE
Document Type and Number:
Japanese Patent JPS57177971
Kind Code:
A
Abstract:

PURPOSE: To improve the adhesiveness of evaporating particles on glass substratas and to form good coating films by connecting the glass substrate which is rotating horizontally in a chamber to a cathode via a supporting frame, a fulcrum shaft and a rotary base plate.

CONSTITUTION: In a chamber 1, a glass substrate 12 is held by a fulcrum shaft 7 secured to a supporting frame 12a, and is rotated and moved in the direction parallel to the chamber 1 in said chamber by a planetary rotating mechanism consisting of a rotating gear 8 meshed with an internal gear 9, and a rotary base plate 4 rotating together with a revolving gear plate 3. The base plate 4 and the ring 9 are insulated respectively from the chamber 1 by insulators 5, 10, and the substrate 12 is connected to an anode via the frame 12a, the shaft 7, the plate 4, a brush 13, a lead wire 17 and a terminal 14, so that the evaporating particles generated from the anode side consisting of a vapor source 15 and a high frequency coil 18 are vapor-deposited efficiently on the glass substrate.


Inventors:
MURAYAMA YOUICHI
NAGASAWA MITSUO
Application Number:
JP6324581A
Publication Date:
November 01, 1982
Filing Date:
April 28, 1981
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MURAYAMA YOUICHI
SHOWA KOUKI SEIZOU KK
International Classes:
C03C17/09; B01J19/08; C23C14/24; C23C14/32; C23C14/50; G02B1/10; G02B1/113; (IPC1-7): B01J19/08; C03C17/09; C23C13/00; C23C13/08; G02B1/10
Domestic Patent References:
JPS51112488A1976-10-04
JPS51128686A1976-11-09
JPS4727217A
JPS5192740A1976-08-14



 
Previous Patent: JPS57177970

Next Patent: BOAT FOR VAPOR DEPOSITION