Title:
HIGH-PRESSURE-JET SPIN CLEANER
Document Type and Number:
Japanese Patent JPH11333387
Kind Code:
A
Abstract:
To provide a high-pressure-jet spin cleaner capable of excellently cleaning a work in a short time without damaging the work.
A high-pressure cleaning soln. is sprayed on a rotating wafer W from a nozzle 42. Consequently, the cleaning soln. hits against the wafer W more powerfully, and the contaminant is easily released from the wafer W. Besides, the released contaminant is blown off toward the periphery of the wafer W along with the cleaning soln. by the centrifugal force due to the rotation of the wafer W and rapidly removed from the wafer.
Inventors:
AMARI MASAHIKO
SEIKE YOSHIYUKI
SEIKE YOSHIYUKI
Application Number:
JP14715598A
Publication Date:
December 07, 1999
Filing Date:
May 28, 1998
Export Citation:
Assignee:
ASAHI SUNAC CORP
International Classes:
B08B3/02; H01L21/304; (IPC1-7): B08B3/02; H01L21/304
Attorney, Agent or Firm:
Kenzo Matsuura