Title:
HIGH SILICON STEEL PLATE EXCELLENT IN HIGH FREQUENCY MAGNETIC PROPERTY AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3896688
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To attain stable and excellent high frequency magnetic property by giving the concentration gradient of Si in the plate thickness direction so that the Si concentration at the surface is higher than that at the center part of the plate thickness and specifying the difference between the max. and the min. of the Si concentration in the plate thickness direction, the Si concentration at the surface and the difference between Si concentration at the front surface and at the back surface.
SOLUTION: A silicon infiltrating treatment for infiltrating Si from the surface of a steal plate in a non-oxidizing atmosphere containing SiCl4 in the concentration of about 0.02-35 mol.% at about 1023-1250°C and a diffusing treatment for diffusing the infiltrated silicon to the steel plate are carried out at the same time, the respective speeds of silicon infiltration and the diffusion are controlled and the operation is ended in a state that the Si concentration at the surface layer is higher than that at the center part. As a result, the high silicon steel plate having the concentration gradient of Si in the plate thickness direction, having higher Si concentration at the surface than that at the center part and controlled to ≥0.3 wt.% in the difference between the max. and the min. of the Si concentration, to 5-7 wt.% in the Si concentration at the surface layer and to ≤1 wt.% in the difference between the Si concentration at the front surface and at the back surface and low in iron loss in high frequency is obtained.
Inventors:
Tsunehiro Yamaji
Katsuji Kasai
Hironori Ninomiya
Yoshikazu Takada
Namikawa Misao
Katsuji Kasai
Hironori Ninomiya
Yoshikazu Takada
Namikawa Misao
Application Number:
JP11436098A
Publication Date:
March 22, 2007
Filing Date:
April 10, 1998
Export Citation:
Assignee:
jfe Steel Corporation
International Classes:
C21D9/46; C23C10/08; C22C38/00; C22C38/02; H01F27/24; (IPC1-7): C22C38/00; C22C38/02; C23C10/08; H01F27/24
Domestic Patent References:
| JP6017202A | ||||
| JP62227033A |
Attorney, Agent or Firm:
Hiroshi Takayama
Previous Patent: APPARATUS FOR TREATING WATER CONTAINING MANGANESE
Next Patent: LOCKING MECHANISM FOR OPEN/CLOSE DOOR OF PHOTOGRAPH PROCESSOR
Next Patent: LOCKING MECHANISM FOR OPEN/CLOSE DOOR OF PHOTOGRAPH PROCESSOR