Title:
HIGH TEMPERATURE AND HIGH PRESSURE PROCESSOR DUE TO LIQUID MEDIUM COMPRESSION
Document Type and Number:
Japanese Patent JP2022181648
Kind Code:
A
Abstract:
To provide a wet and dry isostatic pressing high temperature and high pressure processor for efficiently mass-producing synthetic diamond of high quality and large size.SOLUTION: A treatment apparatus for hydrostatically pressurizing by a pressure medium in liquid by housing a high-pressure cell that prevented intrusion of the pressure medium inside the pressure medium in a high-pressure container, wherein a treatment apparatus 11 is characterized in that there is a pressurizing mechanism 10 of at least one pressure medium 6 capable of firstly utilizing and accompanying the treatment apparatus, by using the pressure medium of which compressibility and volume change rate are known, heating means of the pressure medium and measurement means of a temperature that is an average in a vertical direction are provided, the pressure medium is heated to a predetermined temperature to thermally expand, even after the pressurizing mechanism stopped, the treatment is continued while maintaining the pressure, two or more high pressure cells 9 can be simultaneously subjected to a high temperature and a high pressure treatment with pressures that are non-directive and homogeneous. Check valve, 22, Thermocouple, 27. Cooling jacket, 30. Pressurizing medium heating heater, 31. Partition plate, 65. Copper plate.SELECTED DRAWING: Figure 2
Inventors:
WADA RYUTARO
Application Number:
JP2021088698A
Publication Date:
December 08, 2022
Filing Date:
May 26, 2021
Export Citation:
Assignee:
WADA RYUTARO
International Classes:
B01J3/06