HIGH-ZIRCONIA REFRACTORY FOR MELTING

Japanese Patent JP3524629

B2

PURPOSE: To obtain a high-zirconia refractory for melting containing prescribed chemical components, not causing surface peeling by thermal expansion in heating, having a composition stable at a high temperature for a long period of time and a high electrical resistance, suitable for a glass melting furnace.
CONSTITUTION: To an artificial zirconia obtained by desiliconizing zircon sand as a starting raw material, a specified ratio of a powdery raw material such as Al2O3, SiO2, B2O3, Na2O, K2O, BaO, SrO, MgO, etc., is added melted in an arc electric furnace, cast into a mold, embedded in powder of Bayer alumina and annealed to give the objective high-zirconia refractory comprising 85-96wt.% of ZrO2, 3-8wt.% of SiO2, 0.1-2wt.% of Al2O3, 0.05-3wt.% of B2O3, 0.05-3wt.% of BaO+SrO+MgO, ≥0.05wt.% of Na2O, 0.05-1wt.% of Na2O+K2O, ≤0.2wt.% of P2O5 and ≤0.3wt.% of Fe2O3+TiO2 and having ≤80MPa residual stress and ≤50MPa compression strength.

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Endo, Shigeo
Hirata, Kimio
Seo, Shozo

JP10458795A

May 10, 2004

April 06, 1995

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TOSHIBA MONOFRAX CO LTD

C04B35/48; C04B35/653; (IPC1-7): C04B35/48; C04B35/653

田辺 徹

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