HIGHHSENSITIVE POSITIVE TYPE ELECTRON BEAM FORMATION

Title:

HIGHHSENSITIVE POSITIVE TYPE ELECTRON BEAM FORMATION

Document Type and Number:

Japanese Patent JPS52132678

Kind Code:

A

Abstract:

PURPOSE:To obtain highly sensitive positive-type electron-beam-sensitive conposition by including the polymer containing the prescribed repeated units.

Inventors:

KAWASHIMA KENICHI
SATOU JIYUNJI
MIURA KONOE
EGUCHI CHIHIRO

Application Number:

JP4919376A

Publication Date:

November 07, 1977

Filing Date:

April 28, 1976

Export Citation:

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Assignee:

FUJITSU LTD
MITSUBISHI CHEM IND

International Classes:

G03F7/004; C08F20/00; C08F22/32; C08L31/00; C08L33/00; C08L33/02; C08L33/18; G03F7/039; H01L21/027; H01L21/302; (IPC1-7): C08L31/00; G03C1/71; G03F7/02; H01L21/302

Other References:

IBM TECHNICAL DISC1OSURE BULLETIN#V16#N11=1974

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