Title:
HIGHLY PRECISE PATTERN APPEARANCE INSPECTING DEVICE AND ITS METHOD
Document Type and Number:
Japanese Patent JP3344370
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a highly precise pattern appearance inspecting device for shortening an inspecting time at the time of inspecting the appearance of the pattern of a reticle for measuring an LSI or the LSI itself.
SOLUTION: This highly precise pattern appearance inspecting device is provided with a laser light source 111, scanning means 121 and 126 for scanning a laser beam 119 outgoing from the laser light source 111, a division optical system 130 of a laser beam for branching the laser beam 119 into a plurality of laser beams 138 and 139, an irradiating means for irradiating a sample 182 with the branched laser beams, detecting means 150 or 160 for detecting at least one of a light beam reflected from a sample 182 face and a light beam transmitting through the sample 182 face, and a picture processing means 191 for detecting the defect of the sample face from the picture of the sample 182 face detected by the means 150 or 160. In this case, the laser light source 111 is obtained as a laser light source for simultaneously oscillating a plurality of wavelength.
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Inventors:
Shingo Murakami
Application Number:
JP17305599A
Publication Date:
November 11, 2002
Filing Date:
June 18, 1999
Export Citation:
Assignee:
NEC
International Classes:
G01B11/24; G01B11/245; G01B11/30; (IPC1-7): G01B11/24; G01B11/30
Domestic Patent References:
| JP200018916A | ||||
| JP6342748A | ||||
| JP361802A | ||||
| JP10122842A | ||||
| JP2306146A | ||||
| JP10153410A | ||||
| JP63233308A | ||||
| JP11325831A |
Attorney, Agent or Firm:
Yasuyuki Hata