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Title:
HIGHLY PURE STANDARD PARTICLE FORMER AND HIGHLY PURE STANDARD PARTICLE MADE THEREBY
Document Type and Number:
Japanese Patent JP3836326
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a former that efficiently forms nanometer-size highly pure standard particles having a monodisperse uniform structure and being in the state alleviated in contamination and damage from a material which can be selected from a wide variety of materials and to provide highly pure standard particles.
SOLUTION: This former is constituted by using a particle formation chamber 101 that forms highly pure particles by exciting a semiconductor target with pulse laser beams 109 in a low-pressure rare gas atmosphere, thereby subjecting the target to an abrasion reaction for release and injection and condensing and growing the released and injected matter in air, a chamber 102 that classifies the highly pure particles, and a chamber 103 that collects the highly pure standard particles on a substrate.


Inventors:
Nobuyasu Suzuki
Taketo Yoshida
Toshiharu Makino
Yuka Yamada
Application Number:
JP2001037736A
Publication Date:
October 25, 2006
Filing Date:
February 14, 2001
Export Citation:
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Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
B01J19/12; B03C7/02; B22F9/02; C23C14/00; C23C14/28; G01N15/06; H01L21/203; (IPC1-7): B01J19/12; B03C7/02; B22F9/02; C23C14/00; //H01L21/203
Domestic Patent References:
JP2000282222A
JP6308089A
JP3697499B2
JP60224706A
JP7008792A
Attorney, Agent or Firm:
Masahiro Kurai
Hajime Sakai