Title:
HOLDING CHUCK FOR LITHOGRAPHY SYSTEM
Document Type and Number:
Japanese Patent JP2002198307
Kind Code:
A
Abstract:
To prevent deformations of the substrate, such as thermal expansion and deviation of a substrate from the holding position, at least prevent unexpectable deformations or deviations, on a lithography system which conducts pattern formation using energy beam.
Unexpectable deformations on the substrate or unexpectable deviations from the holding position are prevented by adopting the configuration by which the holding chuck for holding the substrate can be deformed as well.
Inventors:
NOVAK W THOMAS
Application Number:
JP2001319058A
Publication Date:
July 12, 2002
Filing Date:
October 17, 2001
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; G03F7/22; H01J37/305; H01J37/317; H01L21/027; H01L21/68; H01L21/683; (IPC1-7): H01L21/027; G03F7/20; G03F7/22; H01J37/305; H01L21/68
Domestic Patent References:
| JPH07130647A | 1995-05-19 | |||
| JP2001196303A | 2001-07-19 | |||
| JPH07192984A | 1995-07-28 | |||
| JPH05218180A | 1993-08-27 | |||
| JPH08167553A | 1996-06-25 |