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Title:
HOLLOW STRUCTURE FABRICATION METHOD
Document Type and Number:
Japanese Patent JP2011110612
Kind Code:
A
Abstract:

To provide a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well.

This method for producing a hollow structure by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, includes: a step (a) of forming a structural material layer on a substrate; a step (b) of forming a pattern on the structural material layer; a step (c) of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns; a step (d) of further laminating a structural material layer and forming a pattern on the structural material layer laminated; and a step (e) of finally removing the sacrificial material after all of lamination is completed.


Inventors:
KUSAKI WATARU
ISHIHARA TOSHINOBU
Application Number:
JP2009265958A
Publication Date:
June 09, 2011
Filing Date:
November 24, 2009
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
B81C1/00; B32B3/26; G03F7/004; G03F7/40
Domestic Patent References:
JPH05196880A1993-08-06
JP2004074340A2004-03-11
JP2003035874A2003-02-07
JP2000326299A2000-11-28
JP2008285617A2008-11-27
JP2008142967A2008-06-26
JP2008140985A2008-06-19
JP2009223227A2009-10-01
JP2008256969A2008-10-23
JP2006056249A2006-03-02
JPH09118017A1997-05-06
JPH10291317A1998-11-04
JP2008544479A2008-12-04
JP2007146799A2007-06-14
Attorney, Agent or Firm:
Mikio Yoshimiya



 
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