Title:
HOT SPOT AND PROCESS WINDOW MONITOR
Document Type and Number:
Japanese Patent JP2022153592
Kind Code:
A
Abstract:
To provide a measurement overlay target as well as a process defect monitoring method.SOLUTION: At least one of the periodic structures on the target has repeating asymmetric elements along a segmentation direction corresponding to the periodic structure. The asymmetry of the elements can be designed in various ways, for example as asymmetric sub-elements that repeat along a direction perpendicular to a segmentation direction of the elements. The asymmetries of these sub-elements may be designed differently according to the type of process defects being monitored, such as various hot spots, line end shortening, process window parameters, and the like. Measurement results can be used to improve processes and/or increase the accuracy of metrological measurements.SELECTED DRAWING: Figure 4
Inventors:
Golovanevski Boris
Application Number:
JP2022122800A
Publication Date:
October 12, 2022
Filing Date:
August 01, 2022
Export Citation:
Assignee:
KLA Corporation
International Classes:
G03F1/44; G03F7/20
Domestic Patent References:
| JP2012080131A | 2012-04-19 | |||
| JP2014504376A | 2014-02-20 | |||
| JP2011171732A | 2011-09-01 | |||
| JP2008227528A | 2008-09-25 |
Foreign References:
| US7557921B1 | 2009-07-07 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office
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