Title:
金属材料を含むコンポーネント、物理蒸着ターゲット、薄膜、及び金属コンポーネントの形成法
Document Type and Number:
Japanese Patent JP2008533299
Kind Code:
A
Abstract:
The invention includes components containing metallic material. The metallic material can be comprised of a plurality of grains, with substantially all of the grains being substantially equiaxial, and the grains having an average grain size of less than or equal to about 30 microns. The components can be formed by utilization of a uniaxial vacuum hot press together with a starting metallic powder characterized by 325 mesh size. An exemplary component is a sputtering target having a high degree of uniformity across its sputtering face as well as throughout its thickness.
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Inventors:
Morales, Diana El
The Sutras, Susan Dee
The Sutras, Susan Dee
Application Number:
JP2008500698A
Publication Date:
August 21, 2008
Filing Date:
November 29, 2005
Export Citation:
Assignee:
Honeywell International Inc.
International Classes:
B22F3/15; C22C1/04; C23C14/34
Attorney, Agent or Firm:
Kazuo Shamoto
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Naoshi Nakata
Shinjiro Ono
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Naoshi Nakata