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Patent Searching and Data


Title:
要求型希釈マスクレギュレータ及びマスクレギュレータにおける補給用酸素の調節方法
Document Type and Number:
Japanese Patent JP4510885
Kind Code:
B2
Abstract:
A demand and dilution mask regulator comprising an oxygen feed circuit and a dilution circuit for supplying air. The oxygen feed circuit and the dilution circuit are connected to a mixing chamber (35). In the dilution circuit, the inhaled breathe-in air flow rate is measured through a capillary duct (43) connected to a Venturi construction (41). A method of regulating the flow rate of additional oxygen uses flow rate data measured through the capillary duct (43) for controlling the oxygen flow rate to be supplied to the mixing chamber (35).

Inventors:
Bonnet sveline
Marie Patrick
La Morette Didier
Sago Benoit Estaca
Application Number:
JP2007520675A
Publication Date:
July 28, 2010
Filing Date:
July 15, 2004
Export Citation:
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Assignee:
Intel technique
International Classes:
A62B9/02; A61M16/12; A62B7/02; A62B7/14
Domestic Patent References:
JP57117873A
JP4138174A
JP48033957B1
Foreign References:
WO2003039679A1
US4336590
US4856507
US5351682
US3762439
Attorney, Agent or Firm:
Masayuki Masabayashi