Title:
計測ステージの較正の方法
Document Type and Number:
Japanese Patent JP2007509342
Kind Code:
A
Abstract:
The present invention relates to a method for calibrating a metrology stage in at least two dimensions using an artefact plate having marks forming a pattern, comprising the steps of: placing the artefact plate on the metrology stage in at least three positions, assuming the geometrical properties of the metrology stage and the artefact plate, and the positions of the artefact plate for each measurement, forming a model predicting the measurements of the artefact plate, measuring the marks by the metrology stage, and inverting said model to improve the assumptions on metrology stage and artefact plate.
Inventors:
Stibrate, Lars
Ekbark, Peter
Ekbark, Peter
Application Number:
JP2006536487A
Publication Date:
April 12, 2007
Filing Date:
October 27, 2004
Export Citation:
Assignee:
Micronic Laser Systems Activora Get
International Classes:
G01B21/00; G01B1/00; G01B21/04; G01D18/00; G01D21/00; G03F7/20
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Toru Mori
Yutaka Yoshida
Hajime Asamura
Toru Mori
Yutaka Yoshida