Title:
スペーサ付カバーガラスの洗浄方法
Document Type and Number:
Japanese Patent JP4596323
Kind Code:
B2
Abstract:
The present invention provides a method of cleaning a cover glass having a spacer which is to be incorporated in a solid image pickup device, comprising: a dry cleaning step performed after dry etching; a wipe-off cleaning step performed after the dry cleaning step; a primary wet cleaning step performed after the wipe-off cleaning step; and a secondary wet cleaning step performed after the primary wet cleaning step, wherein the cover glass having a spacer is fabricated by a manufacturing process including the steps of: bonding a spacer substrate to a glass substrate with an adhesive; applying a photoresist to the spacer substrate; exposing and developing the photoresist by use of a photomask and forming an etching mask corresponding to the spacer on the spacer substrate; and forming a spacer on the glass substrate by the dry etching the spacer substrate.
Inventors:
Aki Ozeki
Kiyofumi Yamamoto
Masamichi Hara
Kiyofumi Yamamoto
Masamichi Hara
Application Number:
JP2005272389A
Publication Date:
December 08, 2010
Filing Date:
September 20, 2005
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
B08B7/00; B08B1/00; B08B3/08; B08B3/10; B08B3/12; H01L27/14
Domestic Patent References:
| JP2004296740A | ||||
| JP2002082211A |
Attorney, Agent or Firm:
Kenzo Matsuura