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Title:
浄化剤の回収方法
Document Type and Number:
Japanese Patent JP4815066
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for recovering effectively a reusable copper component from a detergent which contains a basic copper carbonate or copper hydroxide used for removing phosphines or a silan base gas contained in an exhaust gas from a semiconductor manufacturing process. SOLUTION: Afer the detergent which contains the basic copper carbonate used for cleaning a hazardous gas containing the phosphines or the silan base gas, or which contains a basic copper hydroxide is soaked in an acid solution, the copper component in the detergent is recovered by generating the precipitate of either one of the copper compound or phosphorous and silicon compounds and separating the copper component from phosphorous and silicon components.

Inventors:
Kenji Otsuka
Takau Shimada
Osugi Minoru
Kawaguchi Kei
Application Number:
JP2001163665A
Publication Date:
November 16, 2011
Filing Date:
May 31, 2001
Export Citation:
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Assignee:
Japan Pionics Co., Ltd.
International Classes:
B01D21/01; B01D53/46; C01G3/00; B01J20/06; B01J20/28; B01J20/34; B09B3/00; B09B5/00; C01G3/02; C02F1/52; C02F1/58; C02F1/60; C02F1/62
Domestic Patent References:
JP2001302243A
JP2289423A
JP8012328A
JP8104519A
JP6319945A
JP60108320A
JP48041153B1



 
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