Title:
一連の堆積技術を用いる耐火性金属層を堆積する方法
Document Type and Number:
Japanese Patent JP5048602
Kind Code:
B2
Abstract:
A method for forming a tungsten layer on a substrate surface is provided. In one aspect, the method includes positioning the substrate surface in a processing chamber and exposing the substrate surface to a soak. A nucleation layer is then deposited on the substrate surface in the same processing chamber by alternately pulsing a tungsten-containing compound and a reducing gas selected from a group consisting of silane, disilane, dichlorosilane and derivatives thereof. A tungsten bulk layer may then be deposited on the nucleation layer using cyclical deposition, chemical vapor deposition, or physical vapor deposition techniques.
Inventors:
Fan, hongbin
Yun, Hyun, Suk A.
Rye, Ken, Gwang
Yang, Sea., Sea.
Horn, james
Sea, Min
Yang, Michael, X.
Chan, Who
Yun, Hyun, Suk A.
Rye, Ken, Gwang
Yang, Sea., Sea.
Horn, james
Sea, Min
Yang, Michael, X.
Chan, Who
Application Number:
JP2008181763A
Publication Date:
October 17, 2012
Filing Date:
July 11, 2008
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C16/02; C23C16/14; C23C16/06; C23C16/08; C23C16/16; C23C16/455; H01L21/28; H01L21/285; H01L21/8242; H01L27/108; H01L29/78; C23C16/44
Domestic Patent References:
| JP8124876A | ||||
| JP5206081A | ||||
| JP7094425A | ||||
| JP6089873A | ||||
| JP11054459A | ||||
| JP7094727A | ||||
| JP4705325B2 | ||||
| JP4174424B2 | ||||
| JP5021123B2 |
Foreign References:
| WO1998051838A1 | ||||
| US5028565 | ||||
| US6156382 | ||||
| US6551929 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Ikeda adult
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Ikeda adult