Title:
ガスの流量を求める方法
Document Type and Number:
Japanese Patent JP6956014
Kind Code:
B2
Abstract:
A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
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Inventors:
Miyoshi Risako
Akikura Norihiko
Kazuyuki Miura
Masaaki Nagase
Satoshi Yamashita
Yohei Sawada
Koji Nishino
Shinichi Ikeda
Akikura Norihiko
Kazuyuki Miura
Masaaki Nagase
Satoshi Yamashita
Yohei Sawada
Koji Nishino
Shinichi Ikeda
Application Number:
JP2018001420A
Publication Date:
October 27, 2021
Filing Date:
January 09, 2018
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G01F1/34
Domestic Patent References:
| JP5538119B2 | ||||
| JP5703032B2 |
Foreign References:
| US7376520 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yoshiki Kuroki
Junji Kashiwaoka