Title:
How to form coating structure and this
Document Type and Number:
Japanese Patent JP6088226
Kind Code:
B2
Abstract:
The invention provides a coating structure and a method for forming the same where, by forming an aluminium oxide layer and a silicon dioxide layer between a product to be coated and a coating layer, durability, reliability and anti-corrosion of the coating layer can be improved and furthermore, product yield can also be improved. The coating structure formed on the surface of a product includes an aluminium oxide (Al 2 O 3 ) layer formed on the surface of the product, a silicon dioxide (SiO 2 ) layer formed on the surface of the aluminium oxide (Al 2 O 3 ) layer, and a coating composition layer formed on the silicon dioxide (SiO 2 ) layer.
Inventors:
Park Summer
Zhao Hoho
Kim Ming
Song Ki-ho
Ham Choru
Huang Jingo
Zhao Hoho
Kim Ming
Song Ki-ho
Ham Choru
Huang Jingo
Application Number:
JP2012263787A
Publication Date:
March 01, 2017
Filing Date:
November 30, 2012
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
B32B9/00; B32B27/00; C09D183/04; C23C14/06; G02B1/10; G02B1/18
Domestic Patent References:
JP2001074931A | ||||
JP2003344155A | ||||
JP2011068000A | ||||
JP2001353808A |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Shinsuke Onuki
Tadahiko Ito
Shinsuke Onuki
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