Title:
ドレッサーの製造方法
Document Type and Number:
Japanese Patent JP7068380
Kind Code:
B2
Abstract:
To provide a polishing pad dresser excellent in high productivity and a manufacturing method thereof.SOLUTION: In a dresser manufacturing method according to an embodiment, a chip portion is prepared in which a Si substrate having a plurality of protrusions on the surface is singulated, a diamond thin film layer is formed on the protrusions of the chip portion to provide the chip portion in which the diamond thin film layer is formed on a base metal. The protrusions are formed by etching the Si substrate with a gas containing C and F.SELECTED DRAWING: Figure 1
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Inventors:
Takahiko Kawasaki
Yuuki Matsui
Satoshi Sidese
Yuuki Matsui
Satoshi Sidese
Application Number:
JP2020082197A
Publication Date:
May 16, 2022
Filing Date:
May 07, 2020
Export Citation:
Assignee:
Kioxia Co., Ltd.
International Classes:
B24B53/017; H01L21/304; B24B53/12; B24D3/00
Domestic Patent References:
| JP11058232A | ||||
| JP2004107765A | ||||
| JP2014154617A | ||||
| JP2002269799A | ||||
| JP3075501A | ||||
| JP2006218577A |
Foreign References:
| US20150283672 | ||||
| US20140256236 |
Attorney, Agent or Firm:
Takuya Takahashi
Keiichi Kobayashi
Masaaki Kurita
Keiichi Kobayashi
Masaaki Kurita