Title:
フォトレジスト組成物用の成膜性樹脂を製造する方法
Document Type and Number:
Japanese Patent JP4072063
Kind Code:
B2
Abstract:
The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).
Inventors:
Rahman M. Darryl
Mackenzie Douglas
Takanori Kudo
Padmanavan Muniratna
Mackenzie Douglas
Takanori Kudo
Padmanavan Muniratna
Application Number:
JP2002582086A
Publication Date:
April 02, 2008
Filing Date:
March 19, 2002
Export Citation:
Assignee:
az Electronic Materials Co., Ltd.
International Classes:
G03F7/26; B01J20/28; B01J47/00; B01J47/12; C08F20/10; C08F20/22; C08F32/00; C08F220/10; C08F232/08; G03F7/039; H01L21/027
Domestic Patent References:
| JP2000338680A | ||||
| JP2000516133A | ||||
| JP2000086725A |
Attorney, Agent or Firm:
Mitsufumi Esaki
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith
Tsuneo Mihara
Okumura Yoshimichi
Blacksmith