Title:
機械パーツを製造する方法
Document Type and Number:
Japanese Patent JP5378898
Kind Code:
B2
Abstract:
The method involves providing a substrate (53) made of a micro-machinable material, etching a pattern with help of photolithography, where the pattern includes a part through the substrate. The etched substrate is mounted on a support so as to leave top and bottom surfaces of the substrate. A coating of better tribological quality than the micro-machinable material is deposited on an outer surface of the part of the pattern. The part of the pattern is released from the substrate. The micro-machinable material is chosen from among group comprising crystalline silicon, crystalline silica and crystalline alumina.
Inventors:
Rudolf Dinger
Thierry Ravenel
Thierry Ravenel
Application Number:
JP2009163495A
Publication Date:
December 25, 2013
Filing Date:
July 10, 2009
Export Citation:
Assignee:
The Swatch Group Research and Development Limited
International Classes:
B81C1/00; G04B15/14; G04D3/00
Domestic Patent References:
| JP2005510698A | ||||
| JP2010019844A | ||||
| JP2009508084A | ||||
| JP2007517679A | ||||
| JP2001513706A | ||||
| JP2002504189A |
Foreign References:
| WO2008055844A1 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa