基板テーブル、リソグラフィ装置、及びリソグラフィ装置を操作する方法

Japanese Patent JP7041717

B2

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Van Zomeren, Dahn, Daniel, Johannes, Antonius
Bartis, Cohen, Hubertus, Mateus
Budenberg, Harold, Sebastian
Gatvilla, Giovanni, Luca
Melman, Johannes, Cornelis, Paulus
Nukiboguru, Gunes
Poletto, Theodorus, Wilhelms
Stals, Walter, Theodorus, Mateus
Van de Pfeiffel, Lily, Johannes, Gabriel
Van Lee Shoot, Josephus, Peter
Vieira Saras, George, Alberto
Zdravkov, Alexander, Nikolov

JP2020113676A

March 24, 2022

July 01, 2020

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ASM L Netherlands B.V.

G03F7/20; H01L21/683

JP2011014905A
JP2013105781A
JP2006270057A
JP2006140257A
JP2010206113A
JP2014060217A
JP2005303167A
JP2008227452A
JP2009054784A
JP2011233888A
JP2010263213A

US20080309891
US20080198346

Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito

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