Title:
How to operate the projection exposure tool for micro lithography
Document Type and Number:
Japanese Patent JP6012628
Kind Code:
B2
Inventors:
Conradi Olaf
Toteck Michael
Raylink Ulrich
Jurgens Dirk
Mueller Ralph
Wald Christian
Toteck Michael
Raylink Ulrich
Jurgens Dirk
Mueller Ralph
Wald Christian
Application Number:
JP2013549717A
Publication Date:
October 25, 2016
Filing Date:
January 20, 2011
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B13/14; G02B13/24
Domestic Patent References:
| JP2010502027A | ||||
| JP2007311782A | ||||
| JP2004221253A | ||||
| JP2007194551A | ||||
| JP2009503826A | ||||
| JP2002175980A | ||||
| JP2006019561A | ||||
| JP2006157020A | ||||
| JP2010511298A | ||||
| JP2011522441A |
Foreign References:
| US20090296055 | ||||
| WO2002054036A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
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