Title:
How to produce or readjust a leak stability gas separation membrane system
Document Type and Number:
Japanese Patent JP6126114
Kind Code:
B2
Abstract:
A method of making a gas separation membrane by providing a plating vessel with a volume of plating solution of gas-selective metal ions into which is placed a porous support. The plating solution is circulated over a surface of the porous support while maintaining conditions within the plating vessel so as to promote the electroless deposition. The circulation rate of the plating solution is such as to enhance the metal deposition onto the surface of the porous support in the formation of the gas separation membrane.
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Inventors:
Sawkaitis, John Charles
Application Number:
JP2014542406A
Publication Date:
May 10, 2017
Filing Date:
November 14, 2012
Export Citation:
Assignee:
Ciel International Research Mart Shats Pay BV
International Classes:
B01D71/02; B01D69/10; B01D69/12; C01B3/56; C23C18/31; C23C18/42
Domestic Patent References:
| JP2004500484A | ||||
| JP8038863A | ||||
| JP2009022843A | ||||
| JP2006239526A | ||||
| JP2010519026A | ||||
| JP2008507395A |
Foreign References:
| WO2008027646A1 |
Attorney, Agent or Firm:
Kawaguchi International Patent Office
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