Title:
基板端縁部被膜の除去方法
Document Type and Number:
Japanese Patent JP4127866
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form a vertical cross-section in which a resist near a surface is prevented from swelling using the smallest possible amount by a method wherein an end of a substrate is inserted into a solvent storage part charged with a specific solvent for cleaning and removing a resist, dipped in the solvent for a predetermine period of time to dissolve and remove excessive attached matters from the edge of the substrate. SOLUTION: When a pair of removal units 10, 10 is moved toward a substrate W, the edges of left and right sides of the substrate W get into a solvent storage part 14a through a slit 20 of the removal unit 10 and a slit 16 of the part 14a. In this case, a solvent for cleaning and removing a resist comprising a dipropylene glycol monoalkyl ether or a mixture of an alkaline solution of a dipropylene glycol monoalkyl ether with a volatile organic solvent having boiling point of 75-130 deg.C and vapor pressure, at 20 deg.C, of 5-75mmHg or an alkaline solution thereof is stored in the part 14a beforehand. Thereafter, the edge of the substrate W is dipped in the solvent to remove a resist film, and gas or pure water is spouted from nozzle holes 23, 24 to clean residuals.
Inventors:
Koichi Nagasawa
Naomi Nagatsuka
Tadashi Shimai
Mitsuru Sato
Koji Harada
Atsushi Koshiyama
Naomi Nagatsuka
Tadashi Shimai
Mitsuru Sato
Koji Harada
Atsushi Koshiyama
Application Number:
JP12597096A
Publication Date:
July 30, 2008
Filing Date:
May 21, 1996
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
B08B3/08; G03F7/40; B08B3/02; H01L21/027; H01L21/304
Domestic Patent References:
| JP8102434A | ||||
| JP7311469A |
Attorney, Agent or Firm:
Yu Koyama