不良箇所の除去方法

Japanese Patent JP7382453

B2

In the present invention, by a scanning-type reduction projection optical system for forming an image from transverse multimode pulsed laser light in a micro-sized area on a donor substrate via a lens array-type zoom homogenizer, an array mask 10, a scanning mirror 4, a photomask 6, and a telecentric projection lens 8, LIFT is performed with high positional accuracy on a receptor substrate that faces a microelement on the donor substrate. As the implementation process thereof, the steps of inspection for acquiring position information, LIFT area division, irradiation position selection, transfer, and stage movement are carried out. Through this configuration it is possible to provide a scanning-type reduction projection optical system whereby a minute irradiation area that is uniform and has an energy distribution devoid of variations can be scanned in a wide range with high precision at high speed while compensating for inadequacy in scanner precision, without the use of a large-aperture, expensive fθ lens or telecentric reduction projection lens, and a LIFT device or the like for packaging or transfer that is equipped with the scanning-type reduction projection optical system, and also to provide an implementation method for the scanning-type reduction projection optical system.

Hiroshi Yamaoka
Goki Nakata
Taketo Usami

JP2022096303A

November 16, 2023

June 15, 2022

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Shin-Etsu Chemical Co., Ltd.

H01L21/52; B23K26/06; B23K26/082; G02B26/10; H01L21/60

JP2018515942A
JP2006041500A
JP10166173A
JP2019527465A
JP2018060993A

WO2020188780A1
US20060007297
US20180053751
US20200168498

Mikio Yoshimiya
Toshihiro Kobayashi
Toru Otsuka

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