HYDROXYSTYRENE POLYMER PROTECTED WITH NEW ACID-SENSITIVE GROUP AND RADIATION-SENSITIVE MATERIAL COMPRISING THE SAME

Japanese Patent JP3808140

B2

PROBLEM TO BE SOLVED: To obtain the subject (co)polymer, protected with specific acid-sensitive groups, having high transmitting properties for far infrared rays, etc., and capable of providing a resist material having a high resolution without generating standing waves based on reflected light.
SOLUTION: This (co)polymer is represented by formula I [(m) and (o) are each ≥1; {(o)/[(m)+(o)]} is 0.1-0.9; (n) 0 or 1; {(n)/[(m)+(n)+(o)]} is 0.05-0.5 even when (n) is ≥1; R1, R2, R5 and R6 are each H or a 1-6C alkyl; R3 and R4 are each H, cyano, a 1-6C alkyl, a 6-10C (substituted)aryl, etc.; R7 and R8 are each H, Cl, Br, etc.; R9 is represented by formula II (R11 is a 2-6C alkylene; X is a direct bond, etc.; R12 is a 1-6C alkyl, etc.)] and protected with acid- sensitive groups. Concretely, the (co)polymer is {4-[1-(2- methanecarbonyloxyethoxy)ethoxy]}styrene/4-hydroxystyrene, etc.

JP2005154304	RADICALLY POLYMERIZABLE HEMIACETAL ESTER DERIVATIVE AND ITS USE
WO/1992/002668	SOLUTION OF ULTRA-HIGH MOLECULAR WEIGHT POLYETHYLENE

Muniratuna Padmanavan
Georg Pavlovski
Yoshiaki Kinoshita
Hiroshi Okazaki
Seiya Masuda
Shun Funato
Satoshi Yamamoto

JP23914196A

August 09, 2006

September 10, 1996

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az Electronic Materials Co., Ltd.

C08F8/00; C09D125/18; C08F212/14; G03F7/039; (IPC1-7): C08F8/00; C08F212/14; C09D125/18

JP10031310A
JP10204125A
JP10053621A
JP8253533A

Hiroki Kaneo
Takeo Noguchi

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