Title:
【発明の名称】帯電防止膜及びその製造方法
Document Type and Number:
Japanese Patent JP2791253
Kind Code:
B2
Abstract:
In a molecule of a monomolecular film, a metal complex is introduced to form an antistatic film. This film is desirably transparent, durable, extremely thin and weakly conductive. The method of manufacturing an antistatic film involves (i) exposing a substrate with an active hydrogen atom thereon to a chemical adsorbent containing a straight carbon-chain group with a silyl group at its end and a phosphate or carboxyl group at the other end to form a chemically adsorbed monomolecular film, and (ii) soaking the monomolecular film in a solution of a metal salt to form a film containing a complex of the metal element. An antistatic multi-monomolecular film can also be formed by laminating the monomolecular films using hydroxyl groups each bonding to the metal element in each monomolecular film.
Inventors:
OGAWA KAZUFUMI
Application Number:
JP23087092A
Publication Date:
August 27, 1998
Filing Date:
August 31, 1992
Export Citation:
Assignee:
MATSUSHITA DENKI SANGYO KK
International Classes:
B32B9/00; B05D1/18; B05D5/12; C08J5/18; C08J7/00; C08J7/04; C09D4/00; C09K3/16; (IPC1-7): B32B9/00; C08J5/18; C08J7/00; C08J7/04; C09K3/16
Domestic Patent References:
| JP5179026A |
Attorney, Agent or Firm:
Hiroyuki Ikeuchi (1 person outside)