PURPOSE: To provide such a phase shift exposure mask that influences of defects such as residue on the substrate and small ruggedness of the surface of the phase shift part (shifter) which shifts the phase of transmitted light can be decreased and that a large defect can be repaired by using FIB or the like.

CONSTITUTION: This phase shift exposure mask has a phase shift part 11 to shift the phase of transmitted light in a part of the light-transmitting part. A film 2 which is optically transparent for the exposure light is formed in a flat state on at least the light-transmitting part required to transfer the pattern and that the difference of refractive index between the phase shift part and the exposure environment is ≤0.45.