PURPOSE: To provide an apparatus and process for producing an optical waveguide which prevent generation of heat by irradiation with electron beams from inducing the deterioration in property of a high polymer, prevent expansion of a waveguide size and feature high throughput at the time of producing the high-polymer optical waveguide by using an electron beam plotting method.
CONSTITUTION: This apparatus for producing the high-polymer optical waveguide by the electron beam plotting method includes a mechanism for raster scanning of regions including at least the core parts of the high-polymer optical waveguide in the areas irradiatable with the electron beams and a mechanism for irradiating only the core parts of the high-polymer optical waveguide with the electron beams. This process for producing the high-polymer optical waveguide comprises irradiating only the core parts of the high-polymer optical waveguide with the electron beams while raster scanning the regions inclusive of at least the core parts of the high-polymer optical waveguide within the areas irradiatable with the electron beams.
TAMAMURA TOSHIAKI
MARUNO TORU
SAKATA TOMOKI
MARUO YOKO
AFUTEI KK