Title:
【発明の名称】電子ビーム露光方法及びその装置
Document Type and Number:
Japanese Patent JP2614884
Kind Code:
B2
Abstract:
A method for depicting a pattern on a sample (15) having a plurality of exposure areas placed on a movable stage (14) by irradiating an electron beam includes the following steps. A pattern density is calculated from data of a pattern to be exposed for every exposure area on the sample. Next, the calculated pattern density is compared with a predetermined pattern density. Then when the calculated pattern density in a first exposure area contained in said exposure pattern areas is lower than the predetermined pattern density, the pattern is depicted therein by a continuous stage moving process. On the other hand, when the calculated pattern density is a second exposure area contained in said exposure areas is equal or higher than the predetermined pattern density, the pattern is depicted therein by a step and repeat process.
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Inventors:
Hiroshi Yasuda
Junichi Kai
Shinji Miyagi
Yasushi Takahashi
Junichi Kai
Shinji Miyagi
Yasushi Takahashi
Application Number:
JP2279588A
Publication Date:
May 28, 1997
Filing Date:
February 04, 1988
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F9/00; G03F7/20; H01J37/302; H01J37/317; H01L21/027; H01L21/30; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP63136624A |
Attorney, Agent or Firm:
Tadahiko Ito