Title:
METHOD FOR REMOVAL OF METAL CONTAMINANT
Document Type and Number:
Japanese Patent JPH0661217
Kind Code:
A
Abstract:
PURPOSE: To remove metal contaminants from the surface by exciting the reactive metal contaminants or soln., by using an optical stimulation enough to react the soln. with the reactive metal contaminants. CONSTITUTION: A substrate 10 is dipped in e.g. a soln. 14 at 25 deg.C, pref. ultra- pure water such as demineralized water, so that the soln. perfectly covers the upper surface 11 of the substrate 10. This physically contacts any metal contaminants 16 on the semiconductor surface 11. The substrate 10-soln. 14 assembly is irradiated with e.g. a visual or infrared ray from e.g. a 200 W-high- voltage Hg-Xe arc lamp for about 5 min. The soln. 14 is drained from the substrate 10, the substrate is rinsed with an ultra-pure surface such as demineralized water to thereby remove a trace of metal contaminants on the surface.
Inventors:
MONTE EI DAGURASU
Application Number:
JP12733893A
Publication Date:
March 04, 1994
Filing Date:
May 28, 1993
Export Citation:
Assignee:
TEXAS INSTRUMENTS INC
International Classes:
H01L21/304; B08B3/10; B08B7/00; C23F4/00; H01L21/00; H01L21/306; H01L21/308; (IPC1-7): H01L21/306; H01L21/304; H01L21/308
Attorney, Agent or Firm:
Akira Asamura (3 outside)
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