PURPOSE: To form electrode by heat treatment at lower temperature than before.
CONSTITUTION: An n-type ZnSe substrate cleaned by an organic solution is fitted to a substrate holder 2b in a vacuum vessel 1b at vacuum degree of about 1×10-8Torr. Next, the water and organic matter are removed from the surface of the substrate by pre-heating the holder with the substrate at 200°C for 15 minutes by a heater. Simultaneously, a mask 3b is burned at 1000°C for one hour for degassing. Next, the burned mask 3b is shifted to the substrate surface sustaining the substrate temperature at 200°C (3a). Finally, while focussing the beams 4c of a halogen lamp (iodine tungsten lamp 60w) 4b on the substrate surface for irradiation, the surface is to be irradiated with molecular beams 5c at the pressure of 1×10-6Torr for one hour.
OKAWA KAZUHIRO
MITSUYU TSUNEO
