Title:
【発明の名称】改良されたフォトレジスト用水溶性反射防止塗料組成物およびその製造法
Document Type and Number:
Japanese Patent JP3492375
Kind Code:
B2
Abstract:
An anti-reflective coating composition for a photoresist and process for producing such a coating having a refractive index of from greater than about 1.20 to about 1.40, which is capable of being applied in a single quarter wavelength thickness and is removable with a developer for the underlying photoresist; the coating composition comprising a copolymer containing the following units: a) where X is CO2L, SO3L, OH, CO(OC2H4)xOH, CONHC(CH3)2CH2SO3L, PO3L2 or CONH2 where L=H, a Group I or Group II cation or NH4<+> and x=0-10; b) where Y is Fluorine or a Fluorine containing aliphatic organic substituent, preferably selected from COO(CH2)x(CF2)nCF3, SO2O(CH2)x(CF2)nCF3, SO2(OC2H4)xO(CH2)x(CF2)nCF3, CO(OC2H4)xO(CH2)x(CF2)nCF3 or c) wherein the aliphatic chain can be branched or unbranched; where R=H, halogen, CF3, C1-C8 alkyl or CN; n=0-14; and x=0-10.
Inventors:
Jain, Sanja
Funk, Rudigel
Funk, Rudigel
Application Number:
JP51201695A
Publication Date:
February 03, 2004
Filing Date:
October 12, 1994
Export Citation:
Assignee:
HNA Holdings Inc.
Hoechst, Akchen Gezel Shaft
Hoechst, Akchen Gezel Shaft
International Classes:
G03F7/004; C09D5/00; C09D133/02; C09D133/04; C09D133/14; C09D133/16; C09D133/18; C09D133/24; C09D137/00; C09D141/00; C09D143/02; C09D155/00; G02B1/10; G03F7/09; G03F7/11; H01L21/027; (IPC1-7): G03F7/11; G03F7/004; H01L21/027
Domestic Patent References:
| JP6110199A | ||||
| JP5241332A |
Other References:
【文献】国際公開93/006170(WO,A1)
Attorney, Agent or Firm:
Mitsufumi Esaki (2 others)