Title:
【発明の名称】半導体装置の製造方法およびフォトマスク
Document Type and Number:
Japanese Patent JP2792447
Kind Code:
B2
Inventors:
KAMIMURA TOSHIHIRO
Application Number:
JP26363394A
Publication Date:
September 03, 1998
Filing Date:
October 27, 1994
Export Citation:
Assignee:
NIPPON DENKI KK
International Classes:
H01L21/822; H01L21/82; H01L27/04; H01L27/118; (IPC1-7): H01L27/118; H01L21/822; H01L27/04
Domestic Patent References:
| JP6194341A | ||||
| JP62194640A | ||||
| JP51117886A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)