Title:
VAPOR GROWTH APPARATUS
Document Type and Number:
Japanese Patent JPH0629226
Kind Code:
A
Abstract:
PURPOSE: To provide a vapor growth apparatus wherein a hetero-structure element in which the uniformity of the film thickness of a growth layer is high and which is provided with a steep heterointerface can be obtained.
CONSTITUTION: A rotating table 101 turned by an external motive force is installed inside a reaction tube. The rotary table 101 holds a substrate 15 or a susceptor 14 on which the substrate 15 has been placed. In addition, an infrared radiant lamp 16 is installed at the outside of the reaction tube 13; the substrate 15 is heated directly by infrared rays or the substrate 15 is heater via the susceptor 14.
Inventors:
KATOU YOSHITAKE
Application Number:
JP20622892A
Publication Date:
February 04, 1994
Filing Date:
July 10, 1992
Export Citation:
Assignee:
NEC CORP
International Classes:
C23C14/50; C23C16/46; C30B25/10; C30B25/12; H01L21/205; (IPC1-7): H01L21/205; C23C14/50; C23C16/46; C30B25/10; C30B25/12
Attorney, Agent or Firm:
Chieko Tateno