Title:
【発明の名称】改良された温度感知および監視を含む短時間アニールシステムおよびその方法
Document Type and Number:
Japanese Patent JP2000516038
Kind Code:
A
Abstract:
A broadband pyrometer is used for sensing temperature of a semiconductor wafer in an RTA system in association with a monochromator to cancel the backside characteristics of the semiconductor wafer. A rapid thermal anneal (RTA) system includes a rapid thermal anneal (RTA) chamber, a heating lamp arranged in the vicinity of the RTA chamber for heating interior to the RTA chamber, a broadband pyrometer disposed in the vicinity of the RTA chamber and directed to measure interior to the RTA chamber, and a grating monochromator connected to the broadband pyrometer.
Inventors:
Robert Dawson
Hohse, Frederick N
Charles Yi, May
Hohse, Frederick N
Charles Yi, May
Application Number:
JP50876798A
Publication Date:
November 28, 2000
Filing Date:
March 28, 1997
Export Citation:
Assignee:
ADVANCED MICRO DEVICES INCORPORATED
International Classes:
G01J5/02; G01J5/00; G01J5/04; G01J5/60; H01L21/26; (IPC1-7): H01L21/26; G01J5/02
Attorney, Agent or Firm:
Fukami Hisaro (3 outside)