Title:
【発明の名称】ナノメートルスケールの細孔のある膜を形成するための装置及び方法
Document Type and Number:
Japanese Patent JP2003514677
Kind Code:
A
Abstract:
A method of forming a membrane with nanometer scale pores includes forming a sacrificial etch stop layer on a substrate. A base layer is constructed on the sacrificial etch stop layer. Micrometer scale pores are formed within the base layer. A sacrificial base layer is built on the base layer. The sacrificial base layer is removed from selected regions of the base layer to define nanometer scale pores within the base layer. The resultant membrane has sub-fifty nanometer pores formed within it.
Inventors:
Hansford, Derek
Ferrari, Mauro
Ferrari, Mauro
Application Number:
JP2001538280A
Publication Date:
April 22, 2003
Filing Date:
November 17, 2000
Export Citation:
Assignee:
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
International Classes:
B82B3/00; B01D67/00; B01D69/02; B01D71/02; B81B3/00; (IPC1-7): B82B3/00
Attorney, Agent or Firm:
Yuzo Yamazaki (2 outside)