Title:
【発明の名称】金属または金属合金ベースのスパッタターゲット、およびその製造のためのプロセス
Document Type and Number:
Japanese Patent JP2003530485
Kind Code:
A
Abstract:
The invention concerns a sputter target on a metal or metal alloy base with a melting point of not more than 750° C., especially tellurium alloy, with a microstructure of powder particles compacted by means of powder metallurgy, where the primary microstructure of the powder particles is very fine as compared with their size and where the particle size is clearly greater than the grain size of the primary microstructure.
Inventors:
Schlot, Martin
Heindel, Joseph
Heindel, Joseph
Application Number:
JP2001575252A
Publication Date:
October 14, 2003
Filing Date:
March 23, 2001
Export Citation:
Assignee:
Unakis Materials Akchen Gesell Shaft
International Classes:
B22D25/02; B22F9/08; B22F9/10; C22C12/00; C22C13/00; C22C18/00; C22C28/00; C23C14/34; (IPC1-7): C23C14/34; B22D25/02; B22F9/08; B22F9/10; C22C12/00; C22C13/00; C22C18/00; C22C28/00
Attorney, Agent or Firm:
Fukami Hisaro (5 others)