Title:
【発明の名称】低水分、且つ高濃度アニオン界面活性剤の製造法
Document Type and Number:
Japanese Patent JPH0640947
Kind Code:
B2
Abstract:
PURPOSE:To obtain a low moisture surfactant, by compounding a compound having one or more of a hydroxyl group in the molecule thereof with a low b.p. solvent and a specific high b.p. solvent in the presence of water in a sulfation process and/or a neutralizing process for obtaining an alkali metal salt. CONSTITUTION:A compound having one or more of hydroxyl group in the molecule thereof is compounded with a low b.p. solvent and a high b.p. solvent forming no azeotropic mixture with said low b.p. solvent in the presence of water in a sulfation process and/or a neutralizing process for obtaining an alkali metal salt to obtain a low moisture high concn. anionic surfactant. As the compound having at least one hydroxyl group in the molecule thereof, there is alkyl or aralkyl phenol such as nonyl phenol or dodecyl phenol and, as the high b.p. solvent forming no azeotropic mixture, there are distyrenated phenol and tribenzyl phenol, etc.
Inventors:
KATAOKA HIRONORI
Application Number:
JP5704185A
Publication Date:
June 01, 1994
Filing Date:
March 19, 1985
Export Citation:
Assignee:
DAI ICHI KOGYO SEIYAKU CO LTD
International Classes:
C07C67/00; C07C301/00; C07C303/24; C07C305/00; C07C305/02; C07C305/06; C07C305/10; C07C305/22; C07C305/24; C09K23/00; C11D1/14; C11D1/22; C11D1/29; C11D11/04; (IPC1-7): B01F17/00; C07C303/24; C07C305/06; C07C305/10; C07C305/24; C11D1/14; C11D1/22; C11D1/29; C11D11/04
Domestic Patent References:
| JP5911331B2 |
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