Title:
【発明の名称】液晶ディスプレイのためのとりわけ半導体としてa:Si-Hを有する薄膜トランジスタから成るマトリクスの製造方法
Document Type and Number:
Japanese Patent JP2001507481
Kind Code:
A
Abstract:
The invention relates to a method for producing a matrix from thin-film transistors, including with a:Si-H as a semiconductor, intended for liquid crystal displays, said method comprising only three lacquering stages. Some processes included in the inventive method are merged as a result of photoresist being submitted to double exposure. Said method enables production of transistors endowed with very good electric properties, as well as liquid crystal displays with little defects of image.
Inventors:
Dieter Schurich
Application Number:
JP52074299A
Publication Date:
June 05, 2001
Filing Date:
August 24, 1998
Export Citation:
Assignee:
ROBERT BOSCH GMBH
International Classes:
G02F1/136; G02F1/1368; H01L21/336; H01L21/77; H01L21/84; H01L29/786; (IPC1-7): G02F1/1368; H01L21/336; H01L29/786
Attorney, Agent or Firm:
Toshio Yano (3 outside)