Title:
【発明の名称】二酸化ケイ素の表面積を低減する方法
Document Type and Number:
Japanese Patent JP2003532608
Kind Code:
A
Abstract:
There is described a method for reducing the surface area of silicon dioxide, which is characterized in that silicon dioxide is introduced into an electromagnetic shielding device selected from an aluminum/magnesium metal shielding device and a hypomagnetic chamber of Permalloy steel, and is incubated for a period of at least 3 hours, preferably at least 6 hours.
Inventors:
Kazna Cheve, Vleil Petro-Vic
Trofi Move, Alexander
Bren, Eugain
Eilambaga, Michael
Ritza, Stefan
Coessel, peter
Fuchs, norbert
Trofi Move, Alexander
Bren, Eugain
Eilambaga, Michael
Ritza, Stefan
Coessel, peter
Fuchs, norbert
Application Number:
JP2001582445A
Publication Date:
November 05, 2003
Filing Date:
May 09, 2001
Export Citation:
Assignee:
Orkofarm Forshunks-Und Entwick Rungs-Gesellschaft Mitt Beschlenktel Haftung
International Classes:
C01B33/12; C01B33/18; C09C1/28; C09C1/30; C09C3/04; (IPC1-7): C01B33/12
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)