Title:
【発明の名称】オルガノクロルシラン及び/又はクロルシラン合成からの残渣の処理方法
Document Type and Number:
Japanese Patent JP2817900
Kind Code:
B2
Abstract:
PCT No. PCT/NO95/00045 Sec. 371 Date Oct. 26, 1995 Sec. 102(e) Date Oct. 26, 1995 PCT Filed Mar. 2, 1995 PCT Pub. No. WO95/27086 PCT Pub. Date Oct. 12, 1995The present invention relates to method for treatment of residues originating from organochlorosilanes- and/or chlorosilane syntheses. The residues are, optionally together with an oxidation agent, supplied to a smelting furnace where the residues are melted in order to form a molten metallic phase comprising at least of silicon and copper and a slag phase, tapping of the metallic melt and an inert slag from the smelting furnace. Copper is dissolved from the solidified silicon-copper containing metallic phase by leaching with a mineral acid in order to produce a solid product substantially containing silicon, whereafter copper is recovered from the leach solution.
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Inventors:
Ikland, Swinger, Johann
Gundersen, Roald
Jensen, Raghild
Gundersen, Roald
Jensen, Raghild
Application Number:
JP52559095A
Publication Date:
October 30, 1998
Filing Date:
March 02, 1995
Export Citation:
Assignee:
Elchem Eyesei
International Classes:
B09B3/00; B01J23/94; B01J27/28; C01B33/02; C01B33/037; C01B33/107; C07F7/12; C07F7/16; C22B3/04; C22B7/00; C22B15/00; (IPC1-7): C22B7/00; C01B33/02; C01B33/037; C22B3/04
Attorney, Agent or Firm:
Shigeru Yagita (1 outside)