Title:
【発明の名称】シリカ膜の製造装置及びその製造方法
Document Type and Number:
Japanese Patent JP2999751
Kind Code:
B2
Abstract:
An apparatus for manufacturing a silica film is provided. The apparatus includes a conveyor including a mounting unit where a plurality of wafers are loaded. The conveyor is used for moving and transferring the mounting wafers. The apparatus also includes a deposition part for generating flames to deposit silica soot on the plurality of wafers, the deposition part being located above the conveyor, and a calcination part, adjacent to the deposition part, removing water from the silica soot, and a sintering part, adjacent to the calcination part, for deifying the calcined silica soot to form a silica film. The process of manufacturing the silica film can be continuously performed, enhancing productivity.
Inventors:
Shinto Uku
Zheng Zhenta
Zheng Zhenta
Application Number:
JP17689998A
Publication Date:
January 17, 2000
Filing Date:
June 24, 1998
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C01B33/12; C23C16/40; C23C16/44; C23C16/453; C23C16/56; H01L31/0248; H01L31/10; (IPC1-7): C23C16/40; C01B33/12; C23C16/44; H01L31/0248; H01L31/10
Attorney, Agent or Firm:
Hidekazu Miyoshi (1 outside)