Title:
【発明の名称】部分的に架橋されたポリマーの製造およびパターン形成でのその使用
Document Type and Number:
Japanese Patent JP2002529552
Kind Code:
A
Abstract:
This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.
Inventors:
Nageshwar Rau Bantu
Donald Frank Perry
Jacqueline Marie Marshall
Timothy Mikel Holt
Donald Frank Perry
Jacqueline Marie Marshall
Timothy Mikel Holt
Application Number:
JP2000581068A
Publication Date:
September 10, 2002
Filing Date:
September 22, 1999
Export Citation:
Assignee:
OLIN MICROELECTRONIC CHEMICALS,INC.
International Classes:
C08F4/00; C08F8/00; C08F8/14; C08F261/00; C08F261/06; C08J3/24; G03F7/039; G03F7/004; H01L21/027; (IPC1-7): C08F8/00; C08F8/14; G03F7/004; G03F7/039; H01L21/027
Foreign References:
| WO1999015935A1 | 1999-04-01 |
Attorney, Agent or Firm:
Chika Takagi (2 outside)