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Title:
ILLUMINATING OPTICAL SYSTEM, EXPOSURE EQUIPMENT, AND PROJECTOR
Document Type and Number:
Japanese Patent JP2012009872
Kind Code:
A
Abstract:

To improve illuminating performance on areas to be irradiated.

An illuminating optical system includes a first laser oscillator (41a); a second laser oscillator (41b); and an optical element (42) to make intensity distribution of incident light in one direction close to a uniform distribution, where laser beams from the first laser oscillator (41a) and the second laser oscillator (41b) respectively enter different spots of the optical element (42), and areas to be irradiated by laser beams which have passed through the optical element (42) from the first laser oscillator (41a) and the second laser oscillator (41b) overlap.


Inventors:
MIYAGAKI KAZUYA
KAMEYAMA KENJI
AISAKA KEISHIN
KATO IKUO
TAKIGUCHI YASUYUKI
Application Number:
JP2011153124A
Publication Date:
January 12, 2012
Filing Date:
July 11, 2011
Export Citation:
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Assignee:
RICOH CO LTD
International Classes:
H01L21/027; G02B5/18; G02B5/32; G02B19/00; G03B21/14
Domestic Patent References:
JP2003022579A2003-01-24
JP4859311B22012-01-25
JPH0980311A1997-03-28
JPS60168133A1985-08-31
JP2003090959A2003-03-28
Attorney, Agent or Firm:
Takao Maruyama